From Miliimeter to Nanometer has been a long and stupendous research work that has been changing our day to day life and experience. Nanotechnology is focused on the engineering and the physical properties of small structures. Therefore techniques that have sensitivities at a scale of 0.1 nm to 1000 nm are required to study these structures.

Growing Nano-layers: We provide turnkey & state of art technical solution for the development & production of Carbon Nano Tubes (Single Wall & Multi Wall cnts), Graphene, nanofibers and nanowires. These innovative systems are based upon Thermal CVD and patented DC Pulsed plasma-enhanced processes using Showerhead technology for Wafer scale device development.

There are many other techniques to grow nanoscale thin layers of gan, gaas, Si, sic, Metals & Dielectrics. These are Sputtering, MBE, CVD and Spin coating etc. Please go to Thin Film section.

Write with Nano-scale resolution: We specialize in nano-scale lithography with great ease together with nano-engineering tools to develop special Nano and Micro Mech Systems. I.e NEMS/MEMS and sensors. This unique fete is achieved using Electron Beam and Ion Beam Lithography tools.

We also provide Optical Lithographic equipment employing NIL technology (Nano-Imprint technology) in Mask Aligners that delivers ultra precise, front side, sub-micron & Nano scale patterning & alignment. Its flexible design allows printing on various substrates Nanoimprint module system is a modular add-on that can be used on any mask aligner.

To complement the Micro to Nano scale device development, we also offer Laser Writer which is used to directly write sub-micron patterns onto the substrates.

Machining with Nano-scale precision: Our ultra-precision machining systems support single point diamond turning, deterministic micro-grinding, precision micro-milling, and glass press molding for the production of advanced optical Components out of Silicon, znse, Germanium, Aluminium & Copper for IR lenses, including diamond turning sphere, asphere, freeform, conformal, lens array, and plano surfaces.

Another technique to Milling the nanoscale structure is Plasma Reactive Ion Etching. There are many techniques to Etch/Mill/Clean the layers. E.g. Inductively Coupled Plasma RIE, ECR RIE & parallel plate Plasma etchers.

Measuring with Nano-scale precision: After producing the Nano-scale devices, we also offer metrology solution with micro- and nanometer resolution.The award-winning measurement systems employ non-contact, non-destructive White Light and Chromatic Light Interferometer technology to collect data about the topography, structure, step height, roughness, wear, thickness and many other parameters of customer’s products.